Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications. David Cameron
Зарубежная образовательная литература.
Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications
Год выпуска 0
isbn 9781118747421
Автор произведения David Cameron
Жанр Зарубежная образовательная литература
Издательство John Wiley & Sons Limited
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.